Hafnium tetrachloride | HfCl4 hupfu | CAS 13499-05-3 | mutengo wefekitari

Hafnium tetrachloride | HfCl4 hupfu | CAS 13499-05-3 | fekitari mutengo Featured Image

Tsanangudzo Pfupi

Hafnium tetrachloride ine zvakakosha zvikumbiro seyakatangira hafnium oxide, inokonzeresa yeorganic synthesis, nyukireya maapplication, uye nhete firimu deposition, ichiratidza kuchinjika kwayo uye kukosha kwayo mune dzakasiyana siyana tekinoroji.

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Product Detail

Product Tags

Product Description

Sumo pfupi

Product Name: Hafnium tetrachloride
Nhamba yeCAS: 13499-05-3
Compound Formula: HfCl4
Molecular uremu: 320.3
Kuonekwa: White powder

Tsanangudzo

Item	Tsanangudzo
Chitarisiko	White Powder
HfCl4+ZrCl4	≥99.9%
Zr	≤200ppm
Fe	≤40ppm
Ti	≤20ppm
Si	≤40ppm
Mg	≤20ppm
Cr	≤20ppm
Ni	≤25ppm
U	≤5ppm
Al	≤60ppm

Application

Hafnium Dioxide Precursor: Hafnium tetrachloride inonyanya kushandiswa sechinhu chinotangira kugadzira hafnium dioxide (HfO2), chinhu chine dielectric yakanaka kwazvo. HfO2 inoshandiswa zvakanyanya mu-high-k dielectric application ye transistors uye capacitor muindasitiri yesemiconductor. HfCl4 yakakosha mukugadzirwa kwemidziyo yemagetsi yepamusoro nekuda kwekugona kwayo kugadzira mafirimu matete ehafnium dioxide.
Organic synthesis catalyst: Hafnium tetrachloride inogona kushandiswa sechigadziriso chezvakasiyana organic synthesis reactions, kunyanya olefin polymerization. Yayo Lewis acid zvimiro zvinobatsira kuumba inoshanda yepakati, nekudaro inovandudza kushanda kwemakemikari kuita. Ichi chishandiso chakakosha mukugadzirwa kwemapolymer uye mamwe organic komisheni muindasitiri yemakemikari.
Nuclear Application: Nekuda kwekukwira kwayo neutron absorption cross section, hafnium tetrachloride inoshandiswa zvakanyanya mukushandisa kwenyukireya, kunyanya mukudzora tsvimbo dzenyukireya. Hafnium inogona kunyatso kutora manyutroni, saka chinhu chakakodzera chekugadzirisa fission process, iyo inobatsira kuvandudza kuchengetedzeka uye kugona kwekugadzira simba renyukireya.
Mutete Firimu Deposition: Hafnium tetrachloride inoshandiswa mumakemikari vapor deposition (CVD) maitiro ekugadzira mafirimu matete ehafnium-based materials. Aya mafirimu akakosha mumhando dzakasiyana dzekushandisa, kusanganisira microelectronics, optics, uye machira ekudzivirira. Kugona kuisa yunifomu, mafirimu emhando yepamusoro anoita kuti HfCl4 ive yakakosha mumagadzirirwo epamberi ekugadzira.